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Atomic Layer Deposition for Semiconductors Softcover reprint of the original 1st ed. 2014 edition
Atomic Layer Deposition for Semiconductors
This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.
273 pages, 89 black & white illustrations, 81 colour illustrations, 3 black & white tables, 1 colour
| Médium | Knihy Paperback Book (Kniha s mäkkou väzbou a lepeným chrbtom) |
| Vydané | 23. augusta 2016 |
| ISBN13 | 9781489979438 |
| Vydavatelia | Springer-Verlag New York Inc. |
| Strany | 263 |
| Rozmery | 234 × 155 × 18 mm · 482 g |
| Jazyk | Angličtina |
| Editor | Hwang, Cheol Seong |