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Interconnect Noise Optimization in Nanometer Technologies Mohamed Elgamel 1st Ed. Softcover of Orig. Ed. 2006 edition
Interconnect Noise Optimization in Nanometer Technologies
Mohamed Elgamel
Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnect Provides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits
160 pages, 1, black & white illustrations
| Médium | Knihy Paperback Book (Kniha s mäkkou väzbou a lepeným chrbtom) |
| Vydané | 29. októbra 2010 |
| ISBN13 | 9781441938442 |
| Vydavatelia | Springer-Verlag New York Inc. |
| Strany | 160 |
| Rozmery | 156 × 234 × 8 mm · 235 g |
| Jazyk | Angličtina |